Search results for "Extreme ultraviolet"

showing 10 items of 47 documents

Modelling of expected B, C, N and O Lyman-α line intensities emitted from W7-X plasmas and measured by means of the W7-X light impurity monitor system

2021

AbstractThe “C/O Monitor” for Wendelstein 7-X (W7-X) is a dedicated light impurity XUV spectrometer intended to measure Lyman-α transitions of hydrogen-like ions of four low-Z impurities—boron (4.9 nm), carbon (3.4 nm), nitrogen (2.5 nm) and oxygen (1.9 nm). Since the discussed diagnostic will deliver continuous information about the line intensities, it is crucial to understand the origin of the obtained signals with respect to the experimental plasma conditions (electron temperature and density). This, however, might be difficult because of the broad acceptance angle of the spectrometer and irregular shape of the plasma edge or SOL where the radiation is expected to mostly come from, depe…

010302 applied physicsElectron densityMaterials scienceSpectrometerGeneral Physics and AstronomyPlasma01 natural sciences010305 fluids & plasmasIonRadiant fluxImpurityExtreme ultraviolet0103 physical sciencesElectron temperatureAtomic physics
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Suppression of the vacuum space-charge effect in fs-photoemission by a retarding electrostatic front lens

2021

Review of scientific instruments 92(5), 053703 (2021). doi:10.1063/5.0046567

010302 applied physicsPhotonMaterials scienceElectronPhotoelectric effect01 natural sciencesFluenceSpace charge010305 fluids & plasmas620Electric fieldExtreme ultraviolet0103 physical sciencesddc:620Atomic physicsInstrumentationStorage ring
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SphinX soft X-ray spectrophotometer: Science objectives, design and performance

2011

The goals and construction details of a new design Polish-led X-ray spectrophotometer are described. The instrument is aimed to observe emission from entire solar corona and is placed as a separate block within the Russian TESIS X- and EUV complex aboard the CORONAS-PHOTON solar orbiting observatory. SphinX uses silicon PIN diode detectors for high time resolution measurements of the solar spectra in the range 0.8–15 keV. Its spectral resolution allows for discerning more than hundred separate energy bands in this range. The instrument dynamic range extends two orders of magnitude below and above these representative for GOES. The relative and absolute accuracy of spectral measurements is e…

Astrophysics::High Energy Astrophysical PhenomenaInstrumentationExtreme ultraviolet lithographyspectrumlaw.inventionX-raySettore FIS/05 - Astronomia E AstrofisicaOpticssolar corona; spectrum; X-ray; abundances; instrumentation; SphinXObservatorylawAstrophysics::Solar and Stellar AstrophysicsSpectral resolutioninstrumentationPhysicsabundanceDynamic rangebusiness.industrysolar coronaSphinXDetectorPIN diodeAstronomy and AstrophysicsSpace and Planetary SciencePhysics::Space PhysicsbusinessOrder of magnitudeSolar System Research
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Detection of security relevant substances within the cooperative project SAFE XUV

2008

The objective of this project funded by the German BMBF was to show that security relevant substances can be detected in complex matrices at low concentrations using single photon ionization ion trap mass spectrometry (SPI-ITMS). The advantage of such a soft ionization technique is a reduction of unwanted fragment ions in mass spectra allowing identification of signals from complex matrices and enabling MS/MS capability. The MS/MS studies permit low false-positive and false-negative rates. Additionally, the accumulation of the ions in the ion trap decreases the detection limit. To obtain low detection limits the ionization potentials (IPs) of the relevant substances have to be below the IPs…

ChemistryIonizationExtreme ultravioletMass spectrumIon trapAtomic physicsPhoton energyIonization energyMass spectrometryIonSPIE Proceedings
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Backward transition radiation in the extreme ultraviolet region as a tool for the transverse beam profile diagnostic

2014

The present article summarizes the results of two experiments which were performed to study the radiation properties of backward transition radiation (BTR) in the extreme ultraviolet (EUV) region. This wavelength region is of particular interest for transverse beam profile imaging, because the spatial resolution is improved as a result of the reduced contribution in the imaging process of the fundamental diffraction limit. In addition, the influence of coherent effects in the transition radiation emission process, which have been observed in the visible region, might be mitigated. The first experiment, dedicated to the investigation of the BTR angular characteristics, indicates that the rad…

DiffractionPhysicsNuclear and High Energy PhysicsPhysics and Astronomy (miscellaneous)business.industryExtreme ultraviolet lithographySurfaces and InterfacesRadiationRadiation propertiesWavelengthOpticsTransition radiationExtreme ultravioletlcsh:QC770-798ddc:530lcsh:Nuclear and particle physics. Atomic energy. RadioactivitybusinessBeam (structure)Physical Review Special Topics. Accelerators and Beams
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X-Raying the Dark Side of Venus - Scatter from Venus Magnetotail?

2016

This work analyzes the X-ray, EUV and UV emission apparently coming from the Earth-facing (dark) side of Venus as observed with Hinode/XRT and SDO/AIA during a transit across the solar disk occurred in 2012. We have measured significant X-Ray, EUV and UV flux from Venus dark side. As a check we have also analyzed a Mercury transit across the solar disk, observed with Hinode/XRT in 2006. We have used the latest version of the Hinode/XRT Point Spread Function (PSF) to deconvolve Venus and Mercury X-ray images, in order to remove possible instrumental scattering. Even after deconvolution, the flux from Venus shadow remains significant while in the case of Mercury it becomes negligible. Since s…

Earth and Planetary Astrophysics (astro-ph.EP)PhysicsPoint spread functionplanets and satellites: atmospheresLine-of-sight010504 meteorology & atmospheric sciencesbiologyExtreme ultraviolet lithographyGamma rayplanets and satellites: individual (Venus)FOS: Physical sciencesFluxAstronomy and AstrophysicsVenusAstrophysicsLight curvebiology.organism_classification01 natural sciencesSettore FIS/05 - Astronomia E AstrofisicaSpace and Planetary Science0103 physical sciencesTransit (astronomy)010303 astronomy & astrophysics0105 earth and related environmental sciencesAstrophysics - Earth and Planetary Astrophysics
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Core (XUV/VUV) and boundary (UV/vis/IR) plasma spectroscopy in fusion devices

2021

This contribution describes the basic applications of passive optical emission spectroscopy in the visible and far-UV region of electromagnetic radiation to diagnostics of the magnetic confinement fusion plasma. To simplify and condense the broad topic it presents the most common ways of analyzing the spectra of atoms, ions and molecules in fusion plasma and disseminating results of those analysis to the non-spectroscopists. It provides the reasons for choosing some particular regions, elements and charge states to determine the impurity content and plasma-surface interactions in MCF (Magnetic Confinement Fusion) reactor. Examples used in the contribution are predominantly from measurements…

FusionMaterials scienceTokamakGeneral Physics and AstronomyMagnetic confinement fusionPlasmaequipment and suppliesElectromagnetic radiationSpectral linelaw.inventionUltraviolet visible spectroscopyPhysics::Plasma PhysicslawExtreme ultravioletAtomic physicsThe European Physical Journal Plus
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Simulating AIA observations of a flux rope ejection

2014

D.H.M. would like to thank STFC, the Leverhulme Trust and the European Commission’s Seventh Framework Programme (FP7/2007-2013) for their financial support. P.P. would like to thank the European Commission’s Seventh Framework Programme (FP7/2007-2013) under grant agreement SWIFF (project 263340, http://www.swiff.eu) and STFC for financial support. These results were obtained in the framework of the projects GOA/2009-009 (KU Leuven), G.0729.11 (FWO-Vlaanderen) and C 90347 (ESA Prodex 9). The research leading to these results has also received funding from the European Commission’s Seventh Framework Programme (FP7/2007-2013) under the grant agreements SOLSPANET (project No. 269299, http:// ww…

Magnetohydrodynamics (MHD)corona [Sun]Sun: coronal mass ejections (CMEs)FOS: Physical sciencesAstrophysicsmagnetohydrodynamics (MHD)7. Clean energyProminencesObservatoryRadiative transferQB AstronomyAstrophysics::Solar and Stellar AstrophysicsQA MathematicsQASun: magnetic fieldsSolar and Stellar Astrophysics (astro-ph.SR)QBPhysicsUV radiation [Sun]Line-of-sightSun: coronaAstronomy and AstrophysicsPlasmaSun: UV radiationCoronacoronal mass ejections (CMEs) [Sun]Magnetic fluxSun: filamentsAstrophysics - Solar and Stellar Astrophysicsmagnetic fields [Sun]13. Climate actionSpace and Planetary ScienceExtreme ultravioletPhysics::Space Physicsfilaments prominences [Sun]Rope
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At-wavelength inspection of sub-40 nm defects in extreme ultraviolet lithography mask blank by photoemission electron microscopy.

2007

A new at-wavelength inspection technology to probe nanoscale defects buried underneath Mo/Si multilayers on an extreme ultraviolet (EUV) lithography mask blank has been implemented using EUV photoemission electron microscopy (EUV-PEEM). EUV-PEEM images of programmed defect structures of various lateral and vertical sizes recorded at an ~13.5 nm wavelength show that 35 nm wide and 4 nm high buried line defects are clearly detectable. The imaging technique proves to be sensitive to small phase jumps, enhancing the edge visibility of the phase defects, which is explained in terms of a standing wave enhanced image contrast at resonant EUV illumination.

Materials sciencebusiness.industryExtreme ultraviolet lithographyAtomic and Molecular Physics and Opticslaw.inventionPhotoemission electron microscopyWavelengthOpticslawExtreme ultravioletMicroscopyOptoelectronicsPhotolithographybusinessLithographyElectron-beam lithographyOptics letters
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Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy

2006

A new method for the actinic at-wavelength inspection of defects inside and ontop of Extreme Ultraviolet Lithography (EUVL) multilayer-coated mask blanks is presented. The experimental technique is based on PhotoElectron Emission Microscopy (PEEM) supported by the generation of a standing wave field inside and above the multilayer mask blank when illuminated near the resonance Bragg wavelength at around 13.5 nm wavelength. Experimental results on programmed defect samples based on e-beam lithographic structures or PSL equivalent silica balls overcoated with an EUV multilayer show that buried defects scaling down to 50 nm in lateral size are detectable with further scalability down to 30 nm …

Materials sciencebusiness.industryExtreme ultraviolet lithographyBlanklaw.inventionStanding waveWavelengthOpticslawExtreme ultravioletMicroscopyOptoelectronicsPhotolithographybusinessLithographySPIE Proceedings
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